Gyeonggi-do, South Korea

Won-il Son

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Enjet Co. Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Won-il Son. Retrieved from https://idiyas.com/inventor/won-il-son-c32amndy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Won-il Son in Conductive Pattern Technology.

Introduction

Won-il Son is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of conductive pattern technology. His innovative approach focuses on enhancing the methods of forming conductive patterns on three-dimensional surfaces.

Latest Patents

Won-il Son holds a patent for a method of forming a 3D conformal conductive pattern. This patent describes a process that involves printing a conductive ink on a substrate with a three-dimensional surface. The method includes several steps: first, a substrate providing step where the substrate is mounted; second, an ink injection step where a conformal conductive pattern is printed by injecting conductive ink using a nozzle while applying an electric field; and finally, a curing step that transforms the injected conductive pattern into a cured conductive pattern.

Career Highlights

Won-il Son is currently associated with Enjet Co. Ltd., where he continues to develop and refine his innovative techniques. His work has garnered attention for its potential applications in various industries, particularly in electronics and materials science.

Collaborations

Won-il Son collaborates with Jang Seung Jun, contributing to advancements in their field through shared expertise and innovative ideas.

Conclusion

Won-il Son's contributions to the field of conductive pattern technology exemplify the impact of innovative thinking in modern engineering. His patent for a method of forming a 3D conformal conductive pattern showcases his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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