Won Ho Sung

Title: The Innovations of Won Ho Sung

Introduction

Won Ho Sung is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving processes and systems that enhance the efficiency and stability of thin-film transistors (TFTs).

Latest Patents

One of his latest patents is titled "System and method of cleaning process chamber components." This invention relates to process systems designed for cleaning semiconductor process chamber components. The system includes a process chamber with various components, such as a substrate support and a gas distribution assembly. A sensor system is integrated to monitor characteristics of the chamber volume, while a dynamic gas assist is employed to optimize the cleaning process.

Another significant patent is "Oxygen vacancy of IGZO passivation by fluorine treatment." This method involves forming a metal oxide layer and treating it with a fluorine-containing gas or plasma. The fluorine treatment effectively fills oxygen vacancies in the metal oxide channel layer, resulting in a more stable TFT and preventing negative threshold voltage issues.

Career Highlights

Won Ho Sung is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to contribute to advancements in semiconductor manufacturing processes.

Collaborations

Throughout his career, Won Ho Sung has collaborated with talented individuals such as Hao-Chien Hsu and Dong-Kil Yim. These collaborations have further enriched his research and development efforts in the semiconductor field.

Conclusion

Won Ho Sung's innovative work in semiconductor technology has led to valuable patents that enhance the efficiency and stability of TFTs. His contributions continue to impact the industry positively.