Won-Hee Lee

Title: Innovations of Won-Hee Lee in Nano Patterning Technology.

Introduction

Won-Hee Lee is a prominent inventor based in Taejon, South Korea. He has made significant contributions to the field of nano patterning technology, holding 2 patents that showcase his innovative approach to printing technology.

Latest Patents

One of his latest patents is a printing head for nano patterning. This invention includes a manifold for accommodating a liquid printing material, a cartridge with an injection chamber communicating with the manifold, and a sample holder for patterning installed outside the injection chamber of the cartridge. The printing head features a shadow mask that can be finely moved in an X-Y direction and has a single injection hole of relatively very small size. An actuator is included for the precise movement of the shadow mask. The injection-inducing unit consists of a high voltage generator and a power supply electrode that generates positive charges, along with an opposite electrode for generating negative charges on the sample holder. This configuration allows for improved patterning accuracy, ultra-fine patterning, and the ability to create arbitrary shapes while simplifying the injection material configuration.

Career Highlights

Won-Hee Lee is affiliated with the Korea Institute of Machinery and Materials, where he continues to advance his research and development in innovative technologies. His work has been instrumental in enhancing the capabilities of nano patterning, which has applications in various high-tech industries.

Collaborations

He has collaborated with notable colleagues such as Dong-Soo Kim and Taek-Min Lee, contributing to a dynamic research environment that fosters innovation and technological advancement.

Conclusion

Won-Hee Lee's contributions to nano patterning technology reflect his dedication to innovation and excellence in engineering. His patents not only enhance the field but also pave the way for future advancements in printing technologies.