Won G Lee

Title: Innovations by Won G Lee in Semiconductor Technology

Introduction

Won G Lee is a notable inventor based in Kangwon, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of contact holes in semiconductor devices. His innovative methods have enhanced the reliability and efficiency of semiconductor manufacturing processes.

Latest Patents

Won G Lee holds a patent for the "Fabrication of contact hole using an etch barrier layer." This patent describes a method of forming a contact hole in a semiconductor device while maintaining the intended electrical isolation of conductive material layers. The method addresses challenges such as mask misalignment and excessive etching that may occur during the fabrication process. By incorporating an etch barrier layer, the method provides an isotropic etching barrier and an electrically insulating layer for the conductive material layers positioned near the contact hole. This innovation ensures that when the contact hole is formed, an electrical short does not occur between the conductive material layers and the conductive material deposited into the contact hole.

Career Highlights

Won G Lee is currently employed at Hyundai Electronics Industries Co. Ltd., where he continues to develop and refine semiconductor technologies. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.

Collaborations

One of his notable collaborators is Mi Young Kang. Together, they have worked on various projects that focus on improving semiconductor fabrication techniques.

Conclusion

Won G Lee's contributions to semiconductor technology, particularly through his patented methods, have significantly impacted the industry. His innovative approaches continue to pave the way for advancements in semiconductor manufacturing processes.