Wolfgang Walch

Title: Wolfgang Walch: Innovator in Exposure Technology

Introduction

Wolfgang Walch is a notable inventor based in Liederbach, Germany. He has made significant contributions to the field of exposure technology, particularly in the manufacturing of printed circuit boards. With a total of 2 patents to his name, Walch's innovations have advanced the efficiency and effectiveness of exposure devices.

Latest Patents

Walch's latest patents include an exposure device designed specifically for contact printing of circuit patterns on printed circuit boards. This device features a tubular light source that spans the width of the exposure field and is housed in a light-permeable casing. The design incorporates a reflector that directs light towards the exposure field, along with a heat insulating plate and an occulting strip to enhance performance.

Another significant patent is for an apparatus that allows for the exposure of both sides of printed circuit plates. This equipment utilizes a master copy and a holder that can accommodate printed circuit plates, enabling simultaneous exposure from two light sources. The dual frame design ensures precise alignment and effective suction during the exposure process.

Career Highlights

Walch is currently associated with Klimsch & Co. Kg, where he continues to innovate in the field of exposure technology. His work has been instrumental in improving the processes involved in printed circuit board manufacturing.

Collaborations

Throughout his career, Walch has collaborated with notable colleagues, including Michael Kiessling and Horst Gelbert. These partnerships have contributed to the development of advanced technologies in the industry.

Conclusion

Wolfgang Walch's contributions to exposure technology have made a lasting impact on the field of printed circuit board manufacturing. His innovative patents reflect his commitment to enhancing efficiency and precision in the industry.