Munich, Germany

Wolfgang Staiger

This inventor holds 1 USPTO granted patent. Top assignee: Trumpf Laser- Und Systemtechnik Gmbh. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wolfgang Staiger. Retrieved from https://idiyas.com/inventor/wolfgang-staiger-0irzxnn1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Wolfgang Staiger - Innovator in Laser Processing Technology

Introduction

Wolfgang Staiger is a notable inventor based in Munich, Germany. He has made significant contributions to the field of laser processing technology. His innovative approach has led to the development of a unique protection device for laser processing units.

Latest Patents

Wolfgang Staiger holds a patent for a protection device of a laser processing unit. This invention includes a first working area for laser processing of a workpiece and a second working area for laser processing of a workpiece. The device features a dividing wall that separates the two working areas, with individual interconnected sections that are moveable in a vertical direction.

Career Highlights

Wolfgang Staiger is currently employed at Trumpf Laser- und Systemtechnik GmbH, a leading company in laser technology. His work at Trumpf has allowed him to focus on advancing laser processing techniques and enhancing safety measures in the industry.

Collaborations

Some of Wolfgang's coworkers include Gunter Fischer and Markus Wirnitzer. Their collaboration has contributed to the innovative environment at Trumpf, fostering advancements in laser technology.

Conclusion

Wolfgang Staiger's contributions to laser processing technology exemplify the spirit of innovation. His patent and work at Trumpf Laser- und Systemtechnik GmbH highlight his commitment to enhancing safety and efficiency in laser applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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