This inventor holds 2 USPTO granted patents. Top assignee: Hoechst Aktiengesellschaft. Active years: 1997-1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1997-1999
Title: Wolfgang Schick: Innovator in Hydrogen Halide Separation
Introduction
Wolfgang Schick is a notable inventor based in Frankfurt, Germany. He has made significant contributions to the field of chemical engineering, particularly in the separation of hydrogen halides from gas mixtures. With a total of 2 patents, his work has implications for various industrial processes.
Latest Patents
Wolfgang Schick's latest patents include a process for separating hydrogen halides from gases containing sulfur. One of his key inventions is a method for separating hydrogen chloride from a gas mixture formed during the chlorination of methane. This gas mixture contains unreacted methane, its chlorination products, and hydrogen chloride produced in the reaction. The process involves cooling and compressing the gas mixture, followed by scrubbing with a liquid that includes at least one chlorination product of methane. This innovative method effectively separates the gas mixture into a methane-containing gas phase and a liquid phase that contains hydrogen chloride and methane chlorination products. The hydrogen chloride is then desorbed from the liquid phase through heating.
Career Highlights
Wolfgang Schick has been associated with Hoechst Aktiengesellschaft, a prominent company in the chemical industry. His work has contributed to advancements in chemical processes and has been recognized within the field.
Collaborations
Wolfgang has collaborated with notable coworkers, including Werner Kraus and Thomas Vernaleken. Their combined expertise has furthered the development of innovative solutions in chemical engineering.
Conclusion
Wolfgang Schick's contributions to the field of hydrogen halide separation demonstrate his innovative spirit and commitment to advancing chemical processes. His patents reflect a deep understanding of chemical engineering and its applications in industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
