Backnang, Germany

Wolfgang Nieuwkamp

This inventor holds 2 USPTO granted patents. Top assignees: Alfred Karcher Gmbh, Alfred Karcher Gmbh & Co.. Active years: 1992-1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wolfgang Nieuwkamp. Retrieved from https://idiyas.com/inventor/wolfgang-nieuwkamp-a02hmv46

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 64(Granted Patents)


Company Filing History:


Years Active: 1992-1995

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Wolfgang Nieuwkamp: Innovator in High-Pressure Cleaning Technology

Introduction

Wolfgang Nieuwkamp is a notable inventor based in Backnang, Germany. He has made significant contributions to the field of high-pressure cleaning technology. With a total of 2 patents to his name, Nieuwkamp has demonstrated his expertise and innovative spirit in this specialized area.

Latest Patents

Among his latest patents are a high-pressure cleaning device with a pump housing/spray gun connection and a high-pressure cleaning apparatus. These inventions reflect his commitment to improving efficiency and functionality in cleaning technologies.

Career Highlights

Nieuwkamp has had a distinguished career, working with prominent companies such as Alfred Kärcher GmbH & Co. and Alfred Kärcher GmbH. His experience in these organizations has allowed him to refine his skills and contribute to the development of advanced cleaning solutions.

Collaborations

Throughout his career, Nieuwkamp has collaborated with talented individuals, including Josef Schneider and Robert Nathan. These partnerships have fostered innovation and creativity in his projects.

Conclusion

Wolfgang Nieuwkamp's contributions to high-pressure cleaning technology through his patents and collaborations highlight his role as a significant inventor in this field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…