London, United Kingdom

Wolfgang M J Hofmann

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wolfgang M J Hofmann. Retrieved from https://idiyas.com/inventor/wolfgang-m-j-hofmann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Innovations of Wolfgang M J Hofmann

Introduction

Wolfgang M J Hofmann is a notable inventor based in London, GB. He has made significant contributions to the field of microelectromechanical systems (MEMS). His work focuses on improving fabrication processes that enhance the performance and reliability of these structures.

Latest Patents

Hofmann holds a patent for "Multiple-level actuators and clamping devices." This patent details improved fabrication processes for microelectromechanical structures. The invention introduces a modification of the known SCREAM process, which is extended to produce a combined vertical etch and release reactive ion etching (RIE) process, referred to as a “combination etch.” This innovative approach allows for the fabrication of single-level micromechanical structures using a novel dry etching process. This process shapes and releases suspended single crystal silicon elements, combining vertical silicon reactive ion etching (Si-RIE) and release etches. This advancement eliminates the need for depositing and patterning silicon dioxide mask layers on the sides of suspended structures, thereby reducing mechanical stresses caused by deposited silicon dioxide films.

Career Highlights

Throughout his career, Hofmann has demonstrated a commitment to advancing the field of MEMS. His innovative approaches have led to significant improvements in the fabrication processes of microelectromechanical structures. His work is recognized for its potential to enhance the functionality and efficiency of various applications in technology.

Collaborations

Hofmann has collaborated with notable professionals in his field, including Hercules Neves and Noel C MacDonald. These collaborations have contributed to the development and refinement of his innovative ideas and patents.

Conclusion

Wolfgang M J Hofmann is a distinguished inventor whose work in microelectromechanical systems has led to significant advancements in fabrication processes. His contributions continue to influence the field and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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