Bar Harbor, ME, United States of America

Wolfgang Eck

This inventor holds 1 USPTO granted patent. Top assignee: Heidelberger Druckmaschinen Ag. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wolfgang Eck. Retrieved from https://idiyas.com/inventor/wolfgang-eck

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Wolfgang Eck: Innovator in Printing Technology

Introduction

Wolfgang Eck is a notable inventor based in Bar Harbor, ME (US). He has made significant contributions to the field of printing technology, particularly with his innovative designs and processes.

Latest Patents

Wolfgang Eck holds a patent for a reusable printing plate, which is designed for use in both wet offset printing and dry offset printing. This invention includes a printing area and a metal oxide surface treated with at least one fluorinated phosphonic acid. The patent also encompasses a printing press and a printing unit that utilize this printing plate, along with processes for imaging the printing plate and preparing a fluorinated organic phosphonic acid. He has 1 patent to his name.

Career Highlights

Eck's career is marked by his work at Heidelberger Druckmaschinen AG, a leading company in the printing industry. His innovative approach has helped advance the technology used in printing processes, making them more efficient and effective.

Collaborations

Wolfgang Eck has collaborated with notable colleagues in his field, including Martin Gutfleisch and Gerhard Daniel Peiter. These partnerships have contributed to the development of cutting-edge printing technologies.

Conclusion

Wolfgang Eck's contributions to printing technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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