San Antonio, TX, United States of America

Wing-kei Au

This inventor holds 1 USPTO granted patent. Top assignee: Vlsi Technology, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wing-kei Au. Retrieved from https://idiyas.com/inventor/wing-kei-au-ibmkwmc4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Wing-kei Au: Innovator in Semiconductor Processing

Introduction

Wing-kei Au is a notable inventor based in San Antonio, TX (US). She has made significant contributions to the field of semiconductor processing, particularly in methods that enhance the durability of quartz hardware during cleaning processes.

Latest Patents

Wing-kei Au holds a patent for a method of protecting quartz hardware from etching during plasma-enhanced cleaning of a semiconductor processing chamber. This innovative method involves introducing a mixture of fluorocarbon gas, oxygen, and water vapor into the chamber. The activation of this mixture forms a quartz-safe plasma cleaning gas. The presence of water vapor is crucial as it substantially suppresses the etching of quartz hardware while leaving the etch rate of polymer contaminants largely unaffected. The fluorocarbon gas used in this method includes CF, and water vapor is introduced at a rate of at least 60 standard cubic centimeters per minute (SCCM).

Career Highlights

Wing-kei Au is associated with VLSI Technology, Inc., where she applies her expertise in semiconductor technology. Her work focuses on improving the efficiency and safety of semiconductor processing techniques.

Collaborations

Wing-kei collaborates with her coworker, Ramiro Solis, to further advance their research and development efforts in the semiconductor industry.

Conclusion

Wing-kei Au's innovative methods in semiconductor processing demonstrate her commitment to enhancing technology in this critical field. Her contributions are paving the way for safer and more efficient manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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