Saint Nazaire les Eymes, France

Wim Besling


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovations of Wim Besling: A Pioneer in Semiconductor Technology

Introduction

Wim Besling, an accomplished inventor based in Saint-Nazaire-les-Eymes, France, has made significant contributions to the field of semiconductor technology. With a focus on innovative methods for enhancing device performance, Besling holds a patent that exemplifies his expertise and creativity in the industry.

Latest Patents

Wim Besling's notable patent is a method for forming metal interconnects in a dielectric material. This patent describes a semiconductor device that includes an interconnect featuring electrically conductive portions and a dielectric layer composed of a first dielectric material. The process involves forming a trench in the dielectric layer, followed by the removal of the exposed portions of the dielectric layer that form the side walls of the trench. Subsequently, a dielectric liner made of a second dielectric material is deposited on the side walls, enhancing the performance and reliability of semiconductor devices.

Career Highlights

Throughout his career, Wim Besling has worked with leading companies in the semiconductor industry. Notably, he has been associated with STMicroelectronics in Crolles and Koninklijke Philips Corporation. His experience in these prestigious organizations has played a crucial role in shaping his innovative approach to semiconductor technology.

Collaborations

Wim Besling has had the opportunity to collaborate with talented professionals in the field, including coworkers Joaquin Torres and Vincent Arnal. These collaborative efforts have strengthened his work and contributed to the advancement of semiconductor solutions, demonstrating the power of teamwork in driving innovation.

Conclusion

Wim Besling stands out as an influential inventor whose work has had a lasting impact on semiconductor technology. His patented method for forming metal interconnects in dielectric materials illustrates his commitment to innovation and the continual improvement of electronic devices. As the semiconductor industry continues to evolve, the contributions of inventors like Besling will undoubtedly play a pivotal role in shaping its future.

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