William Zheng

Title: The Innovative Contributions of William Zheng

Introduction

William Zheng is a notable inventor based in Shamen City, Fujian, China. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique patent that addresses critical challenges in semiconductor cleaning processes.

Latest Patents

William Zheng holds a patent for a semiconductor cleaning step. This invention provides a comprehensive method that includes several key steps. It involves providing a chamber with a bottom surface and a sidewall, where a heater is located on the bottom surface. The process includes a first deposition step that leaves a residual layer on the sidewall of the chamber. Following this, a carbon deposition step forms a carbon layer on at least the surface of the heater. Finally, a plasma cleaning step is performed to simultaneously remove both the residual layer on the sidewall and the carbon layer on the bottom surface. This innovative cleaning method enhances the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

William Zheng is currently employed at United Semiconductor (Xiamen) Co., Ltd. His work at this company has allowed him to focus on advancing semiconductor technologies. His dedication to innovation has positioned him as a key figure in his field.

Collaborations

William Zheng collaborates with talented individuals such as Shih-Feng Su and Chih-Chien Huang. These partnerships foster a creative environment that encourages the exchange of ideas and expertise.

Conclusion

William Zheng's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the industry. His work not only addresses existing challenges but also paves the way for future developments in semiconductor manufacturing.