Fremont, CA, United States of America

William Wilkinson

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William Wilkinson. Retrieved from https://idiyas.com/inventor/william-wilkinson-zb6cxb7i

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: William Wilkinson and Lithography Stitching

Introduction

William Wilkinson is an inventor based in Fremont, California, and is associated with Applied Materials, Inc. His patent work addresses lithography, a process used to create patterned features on substrates.

Latest Patents

Wilkinson is credited with 1 patent, titled “Lithography Stitching.” The patent describes forming patterned features on a substrate by exposing different substrate portions through patterned areas of masks. A first mask forms an initial patterned region, while a second mask—with two patterned areas separated by an unpatterned area—forms additional regions. This approach provides a method for stitching patterned regions across a substrate.

Career Highlights

Wilkinson’s listed invention focuses on mask positioning and radiation exposure to create multiple patterned regions. The patent is associated with Applied Materials, Inc., a company working in materials engineering and semiconductor manufacturing technologies.

Collaborations

Wilkinson’s listed coworkers include Yongan Xu and Jing Guo. Their names provide context for the professional network associated with his work.

Conclusion

William Wilkinson’s patent on lithography stitching describes a method for forming multiple patterned regions on a substrate, reflecting his contribution to lithography-related innovation at Applied Materials, Inc.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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