This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1984.
Company Filing History:
Years Active: 1984
Title: The Innovations of William W. Blair
Introduction
William W. Blair is an accomplished inventor based in Stormville, NY (US). He is known for his significant contributions to the field of E-beam lithography. With a focus on enhancing the precision of electronic beam systems, his work has had a lasting impact on the industry.
Latest Patents
William W. Blair holds a patent for an innovative system titled "Automatic focus and deflection correction in E-beam system using optical." This automatic focus correction system utilizes optical light from a narrow angle light source to illuminate a horizontal slit. The image of this slit is projected onto a target surface, allowing for precise adjustments in focus. The system minimizes vertical space requirements in the E-beam column by projecting the light beam parallel to the target surface. Variations in height cause the slit image to move vertically, prompting the focus of reflection to shift laterally. A prism is employed to redefine this image in the horizontal plane, directing it to a linear diode array that produces a video-type output signal. Autofocus electronics convert this video output into an analog correction signal for the E-beam fine focus coil. Additionally, the video-type signal is transformed into a digital height value for corrections in beam magnification and rotation.
Career Highlights
William W. Blair is associated with the International Business Machines Corporation (IBM), where he has made significant strides in his field. His work has contributed to advancements in E-beam technology, showcasing his expertise and innovative thinking.
Collaborations
Throughout his career, William has collaborated with notable colleagues, including Guenther O. Langner and Samuel Kay Doran. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
William W. Blair's contributions to E-beam lithography through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the field, showcasing the importance of innovation in engineering and technology.