Company Filing History:
Years Active: 2019-2023
Title: The Innovations of William Van Den Daele
Introduction
William Van Den Daele is a notable inventor based in Grenoble, France. He has made significant contributions to the field of radio-frequency applications, holding two patents that showcase his innovative spirit and technical expertise.
Latest Patents
His latest patents include a structure for radio-frequency applications. This structure features a support substrate of high-resistivity silicon, which comprises a lower part and an upper part that has undergone p-type doping to a depth D. The depth D is less than 1 micron, and the upper part contains a mesoporous trapping layer of silicon. This trapping layer has a porosity rate of between 20% and 60%, enhancing the performance of radio-frequency devices.
Career Highlights
William Van Den Daele is currently employed at Soitec, a company known for its advancements in semiconductor materials. His work at Soitec has allowed him to push the boundaries of technology in the field of radio-frequency applications.
Collaborations
He has collaborated with notable coworkers such as Oleg Kononchuk and Eric Desbonnets, contributing to a dynamic and innovative work environment.
Conclusion
William Van Den Daele's contributions to radio-frequency applications through his patents and work at Soitec highlight his role as a key innovator in the field. His advancements continue to influence the development of new technologies.