William T Batchelder

Title: The Innovations of William T. Batchelder

Introduction

William T. Batchelder is a notable inventor based in San Mateo, California. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is the "Droplet jet method for coating flat substrates with resist or similar." This invention provides an efficient and effective way to coat flat surfaces with high-viscosity chemicals, such as photoresist. The method utilizes a piezo electrically controlled droplet jet cartridge to dispense the chemical onto the substrate. The thickness of the coating is precisely controlled by adjusting the dispensing rate. Multiple droplet jet cartridges are aligned to ensure that any gaps in the coating are filled, allowing for a uniform application across the surface. Additionally, for circular surfaces, the substrate is spun while the cartridge moves from the center to the outer edge, applying the chemical in a helical pattern.

Another significant patent is the "Method and apparatus for curing photoresist." This invention involves a substrate photolithography system that features a substrate handling robot capable of pivoting and transferring substrates between various modules, including a photoresist coater, developer, and heating/cooling unit. The robot's end effector allows for both vertical and lateral movement, enabling efficient stacking of the heating/cooling modules. The system introduces a thermally conductive, non-reactive gas, such as helium, into the airspace between the substrate and the hotplate/chillplate to enhance the heating and cooling process.

Career Highlights

William T. Batchelder is currently employed at Semiconductor Systems, Inc., where he continues to innovate and develop new technologies in the semiconductor industry. His work has significantly impacted the efficiency and effectiveness of photolithography processes.

Collaborations

Throughout his career, Batchelder has collaborated with talented individuals, including Michael L. Parodi and Michael R. Biche. These collaborations have contributed to the advancement of technology in their field.

Conclusion

William T. Batchelder's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of efficient coating and curing methods in photolithography.