This inventor holds 2 USPTO granted patents. Top assignee: Dravo Corporation. Active years: 1981.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Denver, CO (US) (1981)
- Denver County, CO (US) (1981)
Company Filing History:
Years Active: 1981
Title: The Innovative Contributions of William R Phillips, Jr.
Introduction
William R Phillips, Jr. is a notable inventor based in Denver, CO (US). He has made significant contributions to the field of process control, particularly in off-gas systems. With a total of 2 patents, his work has had a meaningful impact on industrial processes.
Latest Patents
Phillips' latest patents include a "Method of process off-gas control" and a "Method of controlling series fans driving a variable load." The first patent describes a method for controlling a process off-gas system by generating a model of the input to the system based on gas-generating inputs. This innovative approach allows for effective feedback control of the off-gas system fans, ensuring a minimum flow of leakage air to prevent puffing. The second patent focuses on controlling two series-connected fans that drive a variable throat venturi. This method employs a single flow control feedback loop while ensuring that each fan is protected from surging and overcurrent through their own control loops.
Career Highlights
William R Phillips, Jr. is currently employed at Dravo Corporation, where he continues to develop innovative solutions in process control. His expertise in off-gas systems and fan control has positioned him as a valuable asset in his field.
Collaborations
Phillips has worked alongside notable colleagues such as Ronald D Tate and Radon Tolman. Their collaborative efforts have contributed to advancements in their respective areas of expertise.
Conclusion
William R Phillips, Jr. exemplifies the spirit of innovation through his patents and contributions to process control technology. His work continues to influence the industry and improve operational efficiencies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile