Westfield, NJ, United States of America

William R Hatfield

This inventor holds 1 USPTO granted patent. Top assignee: Engelhard Corporation. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William R Hatfield. Retrieved from https://idiyas.com/inventor/william-r-hatfield

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of William R. Hatfield

Introduction

William R. Hatfield is a notable inventor based in Westfield, NJ (US). He has made significant contributions to the field of chemical engineering, particularly in the recovery of precious metals. His work has had a lasting impact on the efficiency of nitric acid plants.

Latest Patents

William R. Hatfield holds a patent for a "Method for recovering platinum in a nitric acid plant." This innovative method improves the recovery of platinum lost from the catalyst gauze in a nitric acid plant. By utilizing palladium-containing recovery gauzes, he has enhanced the mass transfer characteristics of the system, leading to more efficient platinum recovery.

Career Highlights

Hatfield has spent a significant portion of his career at Engelhard Corporation, where he has applied his expertise in chemical processes. His work has contributed to advancements in the industry, particularly in the area of precious metal recovery.

Collaborations

Throughout his career, Hatfield has collaborated with esteemed colleagues such as Ronald Marshall Heck and Thomas H. Hsiung. These partnerships have fostered innovation and have led to the development of effective solutions in their field.

Conclusion

William R. Hatfield's contributions to the field of chemical engineering, particularly in platinum recovery, demonstrate his innovative spirit and dedication to improving industrial processes. His work continues to influence the industry today.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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