North Haven, CT, United States of America

William L Kuechler

This inventor holds 1 USPTO granted patent. Top assignee: Entoleter, Inc.. Active years: 1977.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William L Kuechler. Retrieved from https://idiyas.com/inventor/william-l-kuechler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 60(Granted Patents)


Company Filing History:


Years Active: 1977

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1 patent (USPTO):Explore Patents

Title: Biography of William L Kuechler

Introduction: William L Kuechler is an accomplished inventor based in North Haven, CT (US). He has made significant contributions to the field of composite materials through his innovative work.

Latest Patents: Kuechler holds a patent for the "Formation of composite particulate material using high energy rotary." This patent discloses a method for creating composite materials using high energy rotary impact milling. The process involves polymer resin particles as the matrix material, combined with solid particle fillers. The resulting materials exhibit strength properties comparable to those of the unfilled matrix material, despite being heavily filled.

Career Highlights: Kuechler has dedicated his career to advancing material science, particularly in the development of composite materials. His work has implications for various industries, enhancing the performance and durability of products.

Collaborations: He is associated with Entoleter, Inc., where he continues to innovate and apply his expertise in composite material formation.

Conclusion: William L Kuechler's contributions to the field of composite materials through his patented inventions demonstrate his commitment to innovation and excellence in material science. His work not only advances technology but also sets a foundation for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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