Colchester, VT, United States of America

William L Hammond


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2008-2010

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2 patents (USPTO):Explore Patents

Title: The Innovations of William L Hammond

Introduction

William L Hammond is a notable inventor based in Colchester, Vermont. He has made significant contributions to the field of technology, particularly in the area of mask and substrate alignment processes. With a total of 2 patents to his name, Hammond's work has had a meaningful impact on the industry.

Latest Patents

Hammond's latest patent focuses on a system for aligning a mask to a substrate in the solder bump process. This innovative system includes a fixture that holds both the mask and substrate in fixed positions relative to each other. It features means for holding the substrate that protrudes through openings in a table and the fixture. The holding mechanism is mounted on a stage that is movable in two directions and rotatable about an axis relative to the table. Additionally, the system includes means for affixing the fixture to the table and controlling the temporary affixing to generate a uniform force around the perimeter of the fixture. This ensures precise alignment of the mask to the substrate, enhancing the efficiency of the solder bump process.

Career Highlights

Hammond is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and develop new technologies. His work at IBM has allowed him to collaborate with other talented professionals in the field, further advancing his contributions to technology.

Collaborations

Some of Hammond's notable coworkers include Duane E Allen and Brian K Burnor. Their collaborative efforts have contributed to the success of various projects within the company.

Conclusion

William L Hammond's contributions to the field of technology through his patents and work at IBM highlight his role as an influential inventor. His innovative approaches to mask and substrate alignment processes demonstrate the importance of precision in technological advancements.

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