This inventor holds 4 USPTO granted patents. Top assignee: Chevron Research Company. Active years: 1983-1986.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1983-1986
Title: The Innovations of William L. Dimpfl
Introduction
William L. Dimpfl is a notable inventor based in Oakland, CA, who has made significant contributions to the field of particle size measurement. With a total of four patents to his name, Dimpfl's work focuses on innovative methods for analyzing gas-entrained particles.
Latest Patents
Dimpfl's latest patents include an "Apparatus for Measuring Particle Size" and a "Method and Apparatus for Measuring Particle Size." Both inventions relate to the measurement of gas-entrained particles by detecting the rate of incandescent burning. In these inventions, entrained particles are passed at a controlled velocity through a heated zone where they are gradually consumed. The radiant energy emitted by the burning particles is detected at varying locations along the path of flow through the heated zone. An indication of particle size distribution is obtained by deriving the third derivative of detected radiant energy intensity with respect to distance of flow through the heated zone.
Career Highlights
Dimpfl is associated with Chevron Research Company, where he has applied his expertise in particle measurement technologies. His work has contributed to advancements in various industrial applications, enhancing the understanding of particle behavior in different environments.
Collaborations
Dimpfl has collaborated with William A. Blanton, Jr., furthering research and development in their field. Their partnership has likely led to innovative solutions and improvements in particle measurement techniques.
Conclusion
William L. Dimpfl's contributions to the field of particle size measurement through his innovative patents demonstrate his commitment to advancing technology. His work continues to impact various industries, showcasing the importance of research and development in understanding particle dynamics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile