US

William Knight

This inventor holds 0 USPTO granted patents, plus 1 CIPO patent.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William Knight. Retrieved from https://idiyas.com/inventor/william-knight-zhsjwwx3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Title: William Knight - Innovator in Feature Extraction Technology

Introduction

William Knight is an accomplished inventor based in the United States. He has made significant contributions to the field of feature extraction technology. His innovative work focuses on identifying critical features in ordered scale space, which has applications in various data analysis scenarios.

Latest Patents

William Knight holds a notable patent titled "Identifying Critical Features In Ordered Scale Space." This patent describes a system and method for identifying critical features within a multi-dimensional feature space. The process involves extracting features from multiple data collections, each characterized by a collection of semantically-related features. The features are normalized, and the frequencies of occurrence and co-occurrences for each feature are determined. The occurrence and co-occurrence frequencies are then mapped into sets of patterns, allowing for the calculation of distance measures between occurrences. This innovative approach enhances the analysis of data collections by projecting frequencies onto a one-dimensional document signal.

Career Highlights

William Knight is currently associated with FTI Technology LLC, where he continues to develop and refine his innovative ideas. His work at the company emphasizes the importance of feature extraction in data analysis and its potential to improve various technological applications.

Collaborations

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Conclusion

William Knight's contributions to the field of feature extraction technology demonstrate his innovative spirit and dedication to advancing data analysis methods. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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