William J Miller

Title: The Innovations of William J. Miller

Introduction

William J. Miller is a notable inventor based in Chittenden County, Vermont. He has made significant contributions to the field of photoresists, particularly in the area of chemically amplified negative tone photoresists. His innovative work has led to the development of a unique composition that addresses microbridging issues in these materials.

Latest Patents

William J. Miller holds a patent for a composition designed to eliminate microbridging in chemically amplified photoresists. The patent, titled "Composition for eliminating microbridging in chemically amplified," describes how microbridge formation in photoresists based on poly(hydroxystyrene) can be avoided. This is achieved by blending poly(hydroxystyrene) with a co-polymer of poly(hydroxystyrene) and an acrylic polymer, such as poly(methyl methacrylate). The blend must contain at least 10% by weight of the co-polymer. The invention utilizes hydrogen bonding between the hydroxystyrene and methacrylate sub-units, which reduces the availability of crosslinking sites, thereby making the blend less susceptible to microbridge formation. This invention is applicable to polymers with a wide range of molecular weights, from 2000 to 50000 daltons, and can be developed using the industry-standard 2.38 wt % trimethylammonium hydroxide (TMAH) developer without negatively impacting the photoresist.

Career Highlights

William J. Miller is associated with the International Business Machines Corporation (IBM), where he has contributed to various research and development projects. His work has been instrumental in advancing the technology behind photoresists, which are critical in the semiconductor manufacturing process.

Collaborations

Throughout his career, William has collaborated with notable colleagues, including James Patrick Collins and Judy B. Dorn. These collaborations have fostered innovation and have led to advancements in the field of photoresist technology.

Conclusion

William J. Miller's contributions to the field of photoresists demonstrate his innovative spirit and dedication to advancing technology. His patent addressing microbridging issues showcases the importance of collaboration and research in driving progress in the industry.