This inventor holds 1 USPTO granted patent. Top assignee: The Carborundum Company. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999
Title: Innovations of William J. Keese
Introduction
William J. Keese is an accomplished inventor based in Youngstown, NY (US). He is known for his significant contributions to the field of materials science, particularly in the development of silicon carbide sputtering targets. His innovative work has led to advancements in the efficiency of sputtering processes, which are crucial in various industrial applications.
Latest Patents
William J. Keese holds a patent for a "Method of coating a substrate with a SiC.sub.x film." This invention provides a silicon carbide sputtering target comprising non-stoichiometric silicon carbide, SiC.sub.x, where x is the molar ratio of carbon to silicon and x is greater than about 1.1 but less than about 1.45. The sputtering target developed by Keese is superior to existing targets, as it allows for a DC magnetron sputtering rate that is nearly an order of magnitude higher than that achievable with currently available targets. The invention also encompasses processes for manufacturing the new sputtering target and for preparing superior silicon carbide films by sputtering the target.
Career Highlights
Keese has made notable strides in his career, particularly through his work at The Carborundum Company. His innovative approach to materials and processes has positioned him as a key figure in the development of advanced materials for various applications. His patent reflects his commitment to enhancing the efficiency and effectiveness of sputtering technologies.
Collaborations
William J. Keese has collaborated with Irving B. Ruppel, Jr., contributing to the advancement of their shared goals in materials science and engineering. Their partnership has fostered innovation and has led to significant developments in the field.
Conclusion
William J. Keese's contributions to the field of materials science, particularly through his patented innovations, have made a lasting impact on the industry. His work continues to influence the development of advanced materials and processes, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile