King's Lynn, United Kingdom

William George Dolman

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Kodak Polychrome Graphics, Gmbh. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William George Dolman. Retrieved from https://idiyas.com/inventor/william-george-dolman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: William George Dolman: Innovator in Lithographic Technology

Introduction

William George Dolman is a notable inventor based in King's Lynn, GB. He is recognized for his contributions to the field of lithographic technology, particularly in the development of resist patterns. His innovative approach has led to advancements in the processing of lithographic printing plates.

Latest Patents

Dolman's most recent patent is titled "Apparatus and methods for development of resist patterns." This integrated apparatus is designed for processing a resist pattern imaged on a substrate, specifically a thermal lithographic printing plate. The apparatus features a chemical development section and a preheat oven that ensures uniform heating of the imaged lithographic plate as it progresses through the system. This innovation enhances the efficiency and quality of the lithographic printing process.

Career Highlights

Throughout his career, Dolman has worked with several prominent companies, including Kodak Polychrome Graphics and Gmbh. His experience in these organizations has contributed significantly to his expertise in lithographic technology.

Collaborations

Dolman has collaborated with various professionals in his field, including his coworker Neil F Haley. These partnerships have fostered innovation and development in lithographic processes.

Conclusion

William George Dolman is a distinguished inventor whose work in lithographic technology has made a significant impact. His patent for the development of resist patterns showcases his innovative spirit and dedication to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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