Plainfield, NJ, United States of America

William G Hughes

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Tenneco Chemicals, Inc.. Active years: 1980-1981.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1980-1981

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2 patents (USPTO):Explore Patents

Title: The Innovations of William G. Hughes

Introduction

William G. Hughes is an accomplished inventor based in Plainfield, NJ (US). He has made significant contributions to the field of chemical engineering, particularly in the production and removal processes of various chemical compounds. With a total of 2 patents to his name, Hughes has demonstrated a commitment to innovation and problem-solving in the chemical industry.

Latest Patents

Hughes' latest patents include a process for the production of benzoic acid from process residues. This innovative method allows for the efficient production of benzoic acid from the liquid phase air oxidation of toluene. Additionally, he has developed a process for the removal of vinyl chloride from aqueous dispersions. This process effectively removes vinyl chloride from dispersions containing 5%-50% by weight of a vinyl chloride resin, achieving a reduction of monomer content to less than 10 ppm.

Career Highlights

Hughes is currently employed at Tenneco Chemicals, Inc., where he continues to apply his expertise in chemical processes. His work has not only advanced the company's capabilities but has also contributed to the broader field of chemical engineering.

Collaborations

Hughes has collaborated with Henri Sidi, a fellow professional in the industry. Their partnership has likely fostered innovative ideas and solutions within their projects.

Conclusion

William G. Hughes is a notable inventor whose work in chemical processes has led to significant advancements in the industry. His patents reflect a deep understanding of chemical engineering and a dedication to innovation.

Profile summary based on public USPTO records.
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