Minneapolis, MN, United States of America

William G Ehrich

This inventor holds 1 USPTO granted patent. Top assignee: Control Data Corporation. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William G Ehrich. Retrieved from https://idiyas.com/inventor/william-g-ehrich-6h08jd6b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: The Innovations of William G. Ehrich

Introduction

William G. Ehrich is a notable inventor based in Minneapolis, MN. He has made significant contributions to the field of VLSI (Very Large Scale Integration) technology. His work focuses on improving the accuracy of clock measurements in integrated circuits.

Latest Patents

William G. Ehrich holds a patent for a "Clock monitor for use with VLSI chips." This innovative application teaches that more accurate measurements of clock skew can be achieved by providing a clock monitor pin directly connected to the clock bus internal to the VLSI chip. This advancement is crucial for enhancing the performance and reliability of VLSI systems.

Career Highlights

Ehrich has had a distinguished career at Control Data Corporation, where he has contributed to various projects and innovations. His expertise in VLSI technology has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, William has worked alongside talented individuals such as Daniel J. Baxter and Don A. Daane. These collaborations have fostered an environment of innovation and creativity, leading to advancements in technology.

Conclusion

William G. Ehrich's contributions to VLSI technology through his patent and work at Control Data Corporation highlight his role as an influential inventor. His innovations continue to impact the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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