This inventor holds 1 USPTO granted patent. Top assignee: Global Mrv, Inc.. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Innovations of William Earl Leatherland, Jr.
Introduction
William Earl Leatherland, Jr. is an accomplished inventor based in Buffalo, NY. He has made significant contributions to the field of emissions measurement technology. His innovative approach has led to the development of a unique apparatus designed to enhance the accuracy of exhaust emissions sensing.
Latest Patents
William holds a patent for an emissions measuring system. This improved apparatus comprises a passive induction sampler configured to sample exhaust from a source. It includes a processing unit connected to the induction sampler, which is designed to be mounted in close proximity to the exhaust source. The processing unit features an input port adapted to receive flow from the passive induction sampler, an output port, and a flow path between the input and output ports. Additionally, it contains a sensor for detecting one or more pollutants in the flow path, a processor for receiving measurements from the sensor, a power source, and a wireless transmitter connected to the processor. This innovative design aims to provide more accurate emissions data.
Career Highlights
William is currently employed at Global MRV, Inc., where he continues to work on advancements in emissions measurement technologies. His expertise and dedication to innovation have positioned him as a valuable asset in his field.
Collaborations
William has collaborated with notable colleagues, including David W. Miller and Brian J. Beckmann. Their combined efforts contribute to the ongoing development of cutting-edge technologies in emissions measurement.
Conclusion
William Earl Leatherland, Jr. exemplifies the spirit of innovation through his work in emissions measurement technology. His contributions are paving the way for more effective environmental monitoring solutions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile