Ledgewood, NJ, United States of America

William E Parr

This inventor holds 3 USPTO granted patents. Top assignee: Koninklijke Philips Corporation N.v.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William E Parr. Retrieved from https://idiyas.com/inventor/william-e-parr-l7q7681s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 141(Granted Patents)


Company Filing History:


Years Active: 2013

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3 patents (USPTO):Explore Patents

Title: The Innovations of William E. Parr

Introduction

William E. Parr is a notable inventor based in Ledgewood, NJ (US). He has made significant contributions to the field of innovation, holding a total of 3 patents. His work primarily focuses on advancements in technology and design, particularly in the area of personal protective equipment.

Latest Patents

One of his latest inventions is a face mask, which showcases his commitment to improving safety and health standards. This innovation reflects the growing need for effective protective gear in various environments.

Career Highlights

William E. Parr is currently employed at Koninklijke Philips Corporation N.V., a leading company in health technology. His role there allows him to leverage his inventive skills to contribute to the development of cutting-edge products that enhance people's lives.

Collaborations

Throughout his career, Parr has collaborated with talented individuals such as Eric Andrew Lieberman and Donald Fraser Van Royen. These partnerships have fostered a creative environment that encourages the exchange of ideas and innovation.

Conclusion

William E. Parr's contributions to the field of invention, particularly in the realm of personal protective equipment, highlight his dedication to improving public health and safety. His work continues to inspire future innovations in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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