Company Filing History:
Years Active: 1994-2001
Title: **William Devore: Innovator in Hybrid Exposure Strategies**
Introduction
William Devore is a prominent inventor based in Hayward, California, recognized for his significant contributions to the field of pattern generation through advanced exposure strategies. With a total of three patents to his name, Devore has been instrumental in developing techniques that enhance the efficiency and precision of various applications.
Latest Patents
Devore's latest innovations include two notable patents that focus on raster scan Gaussian beam writing methods. The first patent, titled **"Raster Scan Gaussian Beam Writing Strategy and Method for Pattern Generation,"** describes a hybrid exposure strategy that utilizes wide-field raster scan deflection combined with a uniformly moving stage to expose long stripes. This method employs periodic analog wide field magnetic scanning, which is augmented by a high-speed electrostatic retrograde scan, allowing the beam to remain substantially stationary during the exposure of rectangular flash fields and Gaussian beams. By creating a staircase deflection trajectory for the beam, this patent improves both precision and exposure rates.
The second patent, **"Raster Shaped Beam Writing Strategy System and Method for Pattern,"** delves further into the hybrid exposure techniques, emphasizing the use of intermediate vector databases and fracture rules to control feature sizes and hierarchical cells. This system allows patterns to be exposed on designs that are significantly smaller than writing pixels. It ensures a high flash rate by leveraging astigmatic illumination and co-planar blanking techniques. Both patents represent a significant leap forward in the field, promising enhanced resolution and operational efficiency.
Career Highlights
Devore's career is marked by his work with leading companies in the tech industry, including Etec Systems, Inc. and AT&T Corporation. His experience in these environments has provided him with the insights and opportunities to develop groundbreaking technologies that push the boundaries of pattern generation.
Collaborations
Throughout his career, Devore has collaborated with notable professionals, including Lee H. Veneklasen and R.L. Smith. These partnerships have facilitated the exchange of ideas that spurred innovative developments in the field, further cementing Devore's reputation as a key figure in the tech innovation landscape.
Conclusion
William Devore's inventive spirit and dedication to innovation have made substantial contributions to the domain of pattern generation. His patents not only showcase his talent but also inspire future advancements in the field. With a unique approach to hybrid exposure strategies, Devore continues to influence the industry and pave the way for new technologies.