William D Hopewell

Title: The Innovations of William D. Hopewell

Introduction

William D. Hopewell is a notable inventor based in Ridgefield, CT (US). He has made significant contributions to the field of lithography, particularly in the development of measurement apparatus and procedures for lithographic equipment. His work is essential for the construction of electronic devices and other technologies.

Latest Patents

William D. Hopewell holds a patent for "Latent-image control of lithography tools." This invention involves a measurement apparatus and procedure that utilizes a Nomarski differential interference contrast microscope in conjunction with a scanned image detector. The technology examines verification marks produced by the projection of an overlay, such as a mask or reticle, upon a photoresist layer. The resulting latent image, while invisible to conventional viewing means, can be observed through phase-contrast imaging. This innovation allows for precise alignment and verification of secondary marks, ensuring accuracy in line width, dosage, focusing, temperature control, and global alignment.

Career Highlights

William D. Hopewell is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has positioned him as a key player in advancing lithographic technologies. His patent reflects his expertise and commitment to innovation in the field.

Collaborations

Some of his notable coworkers include Robert R. Jackson and Jerry C. Shaw. Their collaboration has likely contributed to the advancements in lithography and related technologies.

Conclusion

William D. Hopewell's contributions to lithography through his innovative patent demonstrate his significant role in the field. His work continues to influence the development of electronic devices and technologies.