Berkeley, CA, United States of America

William Boonn

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Rad Ai, Inc.. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William Boonn. Retrieved from https://idiyas.com/inventor/william-boonn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 5.6

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: The Innovations of William Boonn

Introduction

William Boonn is an accomplished inventor based in Berkeley, CA. He has made significant contributions to the field of radiology and resource optimization. With a total of 3 patents to his name, Boonn continues to push the boundaries of innovation in his industry.

Latest Patents

Boonn's latest patents include a "System and method for radiology reporting." This method encompasses various steps such as determining a set of inputs, generating a radiology report, and processing that report. Additionally, he has developed a "System for optimizing resource allocation," which interfaces with contextual data sources and decision-making subsystems to enhance efficiency in resource management.

Career Highlights

William Boonn is currently employed at Rad AI, Inc., where he applies his expertise in developing advanced systems for radiology and resource optimization. His work has been instrumental in improving the accuracy and efficiency of radiology reporting processes.

Collaborations

Boonn collaborates with talented individuals such as John Paulett and Woojin Kim, contributing to a dynamic team focused on innovation and excellence in their field.

Conclusion

William Boonn's contributions to the fields of radiology and resource optimization highlight his innovative spirit and dedication to improving technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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