William A Hargus, Jr

Title: The Innovations of William A Hargus, Jr.

Introduction

William A Hargus, Jr. is a notable inventor based in Lancaster, CA (US). He has made significant contributions to the field of plasma technology, particularly through his innovative patent related to Hall plasma sources. His work is characterized by a focus on low power applications, which is crucial for various technological advancements.

Latest Patents

Hargus holds a patent for a "Low power, linear geometry hall plasma source with an open electron drift." This patent describes the operating characteristics of a linear geometry Hall plasma source scaled to operate in the 50 to 100 Watt power range. The design includes two thruster acceleration channels made of alumina and boron nitride. The differences in operation between these two materials are attributed to their secondary electron emission properties. Notably, operation is achieved despite the absence of a closed electron current drift in the Hall direction, indicating an anomalous axial electron mobility. This phenomenon may be due to plasma fluctuations or collisions with the channel wall. The patent also highlights strong low-frequency oscillations in the discharge current, which vary with changes in the applied magnetic field strength. These oscillations are linked to the depletion of propellant within the discharge and are observed to have a higher frequency than those seen in larger discharges. The linear geometry Hall thrusters allow for simpler magnetic circuit configurations and enable the stacking of multiple thrusters to create modular arrays.

Career Highlights

Hargus is affiliated with Leland Stanford Junior University, where he has contributed to research and development in plasma technology. His work has implications for various applications, including space propulsion systems and other advanced technologies.

Collaborations

Throughout his career, Hargus has collaborated with notable colleagues such as Nathan B Meezan and Mark A Cappelli. These collaborations have furthered the research and development of innovative technologies in the field.

Conclusion

William A Hargus, Jr. is a distinguished inventor whose work in Hall plasma sources has paved the way for advancements in low power applications. His contributions continue to influence the field of plasma technology and inspire future innovations.