Luckington, United Kingdom

William A Craig

This inventor holds 2 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1987-1992.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 25(Granted Patents)


Location History:

  • Bedfordshire, GB (1987)
  • Luckington, GB (1992)

Company Filing History:


Years Active: 1987-1992

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2 patents (USPTO):Explore Patents

Title: The Innovations of William A. Craig

Introduction

William A. Craig is a notable inventor based in Luckington, Great Britain. He has made significant contributions to the field of materials science, particularly in dielectric compositions and thick film conductor compositions. With a total of 2 patents to his name, Craig's work has had a meaningful impact on various technological applications.

Latest Patents

Craig's latest patents include a "Dielectric composition containing kerf additive," which comprises an admixture of finely divided particles. This innovation aims to enhance the performance of dielectric materials. Another significant patent is the "Thick film conductor composition," which also consists of an admixture of finely divided particles, designed to improve the efficiency and effectiveness of thick film conductors.

Career Highlights

William A. Craig is currently employed at E.I. du Pont de Nemours and Company, a leading global science and technology company. His role at DuPont allows him to leverage his expertise in materials science to develop innovative solutions that meet the demands of modern technology.

Collaborations

Throughout his career, Craig has collaborated with esteemed colleagues such as Barry Edward Taylor and Paul C. Donohue. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

William A. Craig's contributions to the field of materials science through his patents and collaborations highlight his role as an influential inventor. His work continues to inspire advancements in technology and materials engineering.

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