Elyria, OH, United States of America

Will Meibuhr

This inventor holds 1 USPTO granted patent. Top assignee: R.w. Beckett Corporation. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Will Meibuhr. Retrieved from https://idiyas.com/inventor/will-meibuhr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: The Innovations of Will Meibuhr

Introduction

Will Meibuhr is an accomplished inventor based in Elyria, OH (US). He is known for his innovative contributions to the field of engineering, particularly through his work at R.W. Beckett Corporation. With a focus on practical solutions, Meibuhr has made significant strides in the development of new technologies.

Latest Patents

Will Meibuhr holds a patent for an igniter cover, showcasing his ability to create functional and efficient designs. This patent reflects his commitment to enhancing safety and performance in ignition systems.

Career Highlights

Throughout his career, Meibuhr has demonstrated a strong dedication to innovation. His work at R.W. Beckett Corporation has allowed him to explore various engineering challenges and develop effective solutions. His single patent is a testament to his inventive spirit and technical expertise.

Collaborations

Meibuhr has collaborated with notable colleagues, including John P. Graham and Martin J. Fabian. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of excellence in engineering.

Conclusion

Will Meibuhr's contributions to the field of invention, particularly through his patent for an igniter cover, highlight his innovative mindset and dedication to engineering. His work continues to inspire those around him and contributes to advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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