Wellington, FL, United States of America

Wiliam G Siegel

This inventor holds 1 USPTO granted patent. Top assignee: Cross Match Technologies Gmbh. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wiliam G Siegel. Retrieved from https://idiyas.com/inventor/wiliam-g-siegel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Wiliam G. Siegel: Innovator in Scanning Technology

Introduction

Wiliam G. Siegel is a notable inventor based in Wellington, FL (US). He has made significant contributions to the field of scanning technology, holding a patent for his innovative work. His expertise and dedication to advancing technology have made him a valuable asset in his industry.

Latest Patents

Wiliam G. Siegel holds a patent for a scanner, showcasing his ability to create solutions that enhance scanning capabilities. This patent reflects his commitment to innovation and the development of practical technologies.

Career Highlights

Siegel is currently employed at Cross Match Technologies GmbH, where he continues to work on cutting-edge technology. His role at the company allows him to apply his skills and knowledge in a collaborative environment, contributing to the advancement of scanning solutions.

Collaborations

Some of his coworkers include Douglas Hodges and Timothy S. McDow. Their collaboration fosters a creative atmosphere that encourages the development of new ideas and technologies.

Conclusion

Wiliam G. Siegel is a distinguished inventor whose work in scanning technology has made a significant impact. His patent and contributions to Cross Match Technologies GmbH highlight his dedication to innovation and collaboration in the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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