Hohenbrunn, Germany

Wilhelm Maurer

This inventor holds 2 USPTO granted patents. Top assignees: Infineon Technologies Ag, Siemens Aktiengesellschaft. Active years: 2002-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wilhelm Maurer. Retrieved from https://idiyas.com/inventor/wilhelm-maurer-as7y2e4g

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: **Wilhelm Maurer: A Pioneer in Semiconductor Mask Technology**

Introduction

Wilhelm Maurer, an innovative inventor based in Hohenbrunn-Riemerling, Germany, has made significant contributions to the field of semiconductor manufacturing. With two notable patents to his name, he has developed methods and devices that enhance the efficiency and effectiveness of integrated circuit fabrication.

Latest Patents

Maurer’s latest innovations include a method for generating corrected patterns for a phase-shifting mask and its trimming mask, as well as an associated device and integrated circuit configuration. This method involves a two-step correction process that simplifies the correction of mask data used in the production of very-large-scale integrated circuits. By first correcting the pattern for the phase-shifting mask and then applying it to correct the trimming mask, Maurer’s approach allows for greater precision in semiconductor manufacturing.

His other significant invention is a trimming mask with semitransparent phase-shifting regions. This innovation enables the lithographic production of extremely small structures that are less than the exposure wavelengths traditionally used in semiconductor fabrication. The technique employs a double exposure method utilizing a thick phase mask alongside the trimming mask to enhance the contrast of phase-contrast lines. This allows for the production of dimensionally critical structures that were previously challenging to achieve.

Career Highlights

Throughout his career, Maurer has been associated with reputed companies such as Infineon Technologies and Siemens Aktiengesellschaft. His experiences in these organizations have honed his skills and expanded his understanding of the cutting-edge technologies in semiconductor production.

Collaborations

Maurer has collaborated with talented professionals like Marco Ahrens and Juergen Knobloch. Working alongside such collaborators has contributed to the sophisticated development of his inventions, highlighting the importance of teamwork in advancing technology.

Conclusion

With his inventive spirit and dedication, Wilhelm Maurer continues to influence the semiconductor industry through his pioneering methods and devices. His patents not only showcase his expertise but also contribute to the broader field of integrated circuit design, paving the way for further advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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