Wilhelm Knobloch

Title: Wilhelm Knobloch: Innovator in Photoresist Technology

Introduction

Wilhelm Knobloch is a notable inventor based in Schworstadt, Germany. He has made significant contributions to the field of photoresist technology, holding a total of 3 patents. His work has been instrumental in advancing the capabilities of photoresist compositions used in various applications.

Latest Patents

Knobloch's latest patents include innovative formulations such as Tetra (hydroxphenyl) alkanes and positive photoresist compositions. These compositions are designed to enhance resolution and reduce defects in photoresist applications. His research focuses on the use of organic solvents to improve the performance of photoresists, making them more effective for industrial use.

Career Highlights

Throughout his career, Wilhelm Knobloch has worked with prominent companies in the industry. He has been associated with Ciba-Geigy Corporation and OCG Microelectronics, Inc., where he contributed to the development of advanced materials and technologies. His expertise in photoresist technology has positioned him as a key figure in the field.

Collaborations

Knobloch has collaborated with several professionals in his field, including Reinhard Schulz and Martin Roth. These collaborations have fostered innovation and have led to the successful development of new technologies in photoresist applications.

Conclusion

Wilhelm Knobloch's contributions to photoresist technology and his innovative patents have made a lasting impact on the industry. His work continues to influence advancements in materials science and engineering.