Wilhelm Claussen

Title: Wilhelm Claussen: Innovator in Semiconductor Technology

Introduction

Wilhelm Claussen is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

Claussen's latest patents include a method for making contact with a doping region of a semiconductor component. This method involves applying an insulating layer on a substrate surface, forming a contact hole, and depositing a metal-containing layer. A thermal process is then employed to react the metal with silicon, forming a metal silicide layer. His second patent focuses on fabricating a semiconductor structure, where an antireflection layer is applied by PECVD to a hard mask layer composed of doped silicon oxide. This process simplifies previous wet etching methods, enhancing efficiency in semiconductor fabrication.

Career Highlights

Throughout his career, Claussen has worked with prominent companies such as Siemens Aktiengesellschaft and Infineon Technologies AG. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor technology.

Collaborations

Claussen has collaborated with notable colleagues, including Barbara Lorenz and Klaus Dieter Penner. These partnerships have contributed to his success and the advancement of semiconductor technologies.

Conclusion

Wilhelm Claussen's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods continue to impact the industry positively.