Company Filing History:
Years Active: 2003-2010
Title: Wilfred Pau: Innovator in Etching Technologies
Introduction
Wilfred Pau is a notable inventor based in Santa Clara, CA (US), recognized for his contributions to etching technologies. He holds 2 patents that showcase his innovative approaches in the field.
Latest Patents
One of his latest patents is titled "Method for etching having a controlled distribution of process results." This invention provides methods for etching a substrate by determining a substrate temperature target profile that corresponds to a uniform deposition rate of etch by-products. The method involves preferentially regulating the temperature of different portions of a substrate support to achieve the desired temperature profile. Another significant patent is "Method of detecting an endpoint during etching of a material within a recess." This method allows for the detection of an endpoint during the etching process, utilizing thin film interferometric endpoint detection to ensure a clear and distinct signal.
Career Highlights
Wilfred Pau is currently employed at Applied Materials, Inc., where he continues to develop and refine etching technologies. His work has significantly impacted the semiconductor manufacturing industry, enhancing the precision and efficiency of etching processes.
Collaborations
Throughout his career, Wilfred has collaborated with esteemed colleagues, including Meihua Shen and Jeffrey D. Chinn. These collaborations have contributed to the advancement of innovative solutions in the field of etching.
Conclusion
Wilfred Pau's contributions to etching technologies through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes.