Gaertringen-Rohrau, Germany

Werner Zapka


Average Co-Inventor Count = 4.7

ph-index = 5

Forward Citations = 83(Granted Patents)


Location History:

  • Gaertringen-Rohrau, DE (1986 - 1989)
  • Rohrau, DE (1990)
  • Gartringen-Rohrau, DE (1991)

Company Filing History:


Years Active: 1986-1991

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5 patents (USPTO):

Title: Innovations by Werner Zapka in Submicron Technologies

Introduction

Werner Zapka, an esteemed inventor based in Gaertringen-Rohrau, Germany, has made significant contributions to the field of nanotechnology. With a remarkable portfolio that includes five patents, Zapka specializes in processes that enhance the manufacturing and cleaning of micro and submicron materials.

Latest Patents

Among his notable inventions, Zapka’s recent patents include a **Process for Making Masks with Structures in the Submicron Range**. This intricate process entails creating structures of photoresist or polymer materials on silicon substrates with an oxide layer. Utilizing technologies such as Low-Pressure Chemical Vapor Deposition (LPCVD), Zapka ensures the production of highly accurate features essential for modern lithography. His second patent revolves around **Removal of Particles from Solid-State Surfaces by Laser Bombardment**, employing high-power dense excimer laser pulses to clean surfaces, particularly useful for Si-masks in electron-beam lithographic devices.

Career Highlights

Werner Zapka’s work, especially with International Business Machines Corporation (IBM), has been instrumental in advancing the precision of nanofabrication techniques. His focus on photolithography processes has broadened the horizon for innovations in this realm, enabling improvements in manufacturing efficiency and accuracy.

Collaborations

Throughout his career, Zapka has collaborated with other esteemed individuals in the industry, including Joachim H Keyser and Karl Asch. These partnerships have contributed to the development and refinement of groundbreaking technologies that push the boundaries of what is achievable in microfabrication.

Conclusion

Werner Zapka's innovative mind and collaborative spirit continue to leave an indelible mark on the fields of nanotechnology and lithography. His patents significantly enhance the capabilities of modern manufacturing, proving essential for the future of high-precision applications. As his work progresses, it is anticipated that he will continue to contribute to the advancements in technology that shape our world.

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