Neuhausen, Germany

Werner Loose

This inventor holds 1 USPTO granted patent. Top assignee: Daimler-Benz Ag. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Werner Loose. Retrieved from https://idiyas.com/inventor/werner-loose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Werner Loose: Innovator in Semiconductor Technology

Introduction

Werner Loose is a notable inventor based in Neuhausen, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the development of field-effect transistors.

Latest Patents

Werner Loose holds a patent for a SIC field-effect transistor array with ring type trenches and method of fabrication. This innovation showcases his expertise in enhancing the performance and efficiency of semiconductor devices.

Career Highlights

Werner Loose is currently employed at Daimler-Benz AG, where he applies his knowledge and skills to advance technology in the automotive sector. His work has been instrumental in integrating cutting-edge semiconductor solutions into modern vehicles.

Collaborations

Throughout his career, Werner has collaborated with esteemed colleagues such as Jacek Korec and Ekkehard Niemann. These partnerships have fostered innovation and contributed to the success of various projects.

Conclusion

Werner Loose is a distinguished inventor whose work in semiconductor technology continues to impact the industry positively. His contributions, particularly in the realm of field-effect transistors, highlight his role as a key player in technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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