Werner Gillijns

Title: Werner Gillijns: Innovator in Lithographic Mask Design

Introduction

Werner Gillijns is a notable inventor based in Holsbeek, Belgium. He has made significant contributions to the field of lithography, particularly in the design of lithographic masks. His innovative approach has led to the development of a method that enhances the accuracy and efficiency of printing patterns of structural features.

Latest Patents

Gillijns holds a patent for a "Method for designing a lithographic mask." This patent outlines a methodology that utilizes Optical Proximity Correction (OPC) to produce simulated patterns that reflect how they would be printed through an optimized mask. The process involves creating a real mask based on the optimized design and subsequently making an actual print through this mask. To ensure the accuracy of the printed pattern and the performance on the wafer, experimental contours are extracted from Critical Dimension Scanning Electron Microscope (CD-SEM) measurements. The verification process compares the contours obtained from the printed pattern with the intended pattern and/or the simulated contour, allowing for a direct comparison between simulation and experiment.

Career Highlights

Throughout his career, Werner Gillijns has worked with prominent organizations, including Imec Vzw and Katholieke Universiteit Leuven. His experience in these institutions has contributed to his expertise in lithographic technologies and methodologies.

Collaborations

One of his notable collaborators is Julien Mailfert, with whom he has worked on various projects related to lithography and mask design.

Conclusion

Werner Gillijns is a distinguished inventor whose work in lithographic mask design has advanced the field significantly. His innovative methods and collaborations have paved the way for more accurate and efficient lithographic processes.