Company Filing History:
Years Active: 2011-2015
Title: Weon-Ho Shin: Innovator in Semiconductor Technology
Introduction
Weon-Ho Shin is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative work focuses on enhancing the efficiency and functionality of semiconductor materials.
Latest Patents
One of Weon-Ho Shin's latest patents is titled "Semiconductor photocatalyst coated with graphitic carbon film and method of fabricating the same." This invention involves a semiconductor that is uniformly coated with a graphitic carbon film, which is fabricated through hydrothermal synthesis and pyrolysis of glucose. The method ensures that the original structure and crystallinity of the semiconductor photocatalyst are preserved, providing a robust support for the carbon film.
Another notable patent is the "Method for patterning nanomaterial using solution evaporation." This method outlines a process for patterning nanomaterials by coating them with a polymer material and dispersing them in a solvent. The nanomaterial-containing solution is then poured onto a substrate, allowing for precise patterning after the solvent evaporates.
Career Highlights
Weon-Ho Shin is affiliated with the Korea Advanced Institute of Science and Technology, where he continues to push the boundaries of semiconductor research. His work has garnered attention for its innovative approaches and practical applications in various technological fields.
Collaborations
He has collaborated with notable colleagues such as Jeung-Ku Kang and Jung-woo Lee, contributing to a dynamic research environment that fosters innovation and discovery.
Conclusion
Weon-Ho Shin's contributions to semiconductor technology exemplify the spirit of innovation. His patents reflect a commitment to advancing the field and improving the functionality of semiconductor materials.