The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2014
Filed:
Feb. 03, 2009
Jeung-ku Kang, Daejeon, KR;
Kyung-min Choi, Daejeon, KR;
Jung-hoon Choi, Daejeon, KR;
Weon-ho Shin, Daejeon, KR;
Jung-woo Lee, Daejeon, KR;
Hyung-mo Jeong, Daejeon, KR;
Jeung-Ku Kang, Daejeon, KR;
Kyung-Min Choi, Daejeon, KR;
Jung-Hoon Choi, Daejeon, KR;
Weon-Ho Shin, Daejeon, KR;
Jung-Woo Lee, Daejeon, KR;
Hyung-Mo Jeong, Daejeon, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Abstract
Disclosed is a method for patterning a nanomaterial using solution evaporation. More particularly, the method for patterning a nanomaterial using solution evaporation includes; coating the nanomaterial with a polymer material and uniformly dispersing the coated nanomaterial in a solvent to prepare a solution containing the nanomaterial, and pouring the nanomaterial-containing solution on a substrate, enabling the nanomaterial to be patterned after evaporation of the solvent.