Weifang, China

Wenyue Wang

This inventor holds 1 USPTO granted patent. Top assignee: Goertek Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenyue Wang. Retrieved from https://idiyas.com/inventor/wenyue-wang-merklorg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Wenyue Wang: Innovator in Projection Technology

Introduction

Wenyue Wang is a prominent inventor based in Weifang, China. She has made significant contributions to the field of projection technology. Her innovative work has led to the development of a unique projector and projection positioning method.

Latest Patents

Wenyue Wang holds a patent for a projector and projection positioning method. This invention includes a projector body, a first ranging sensor, a processor, and a focal length controller. The projector body is equipped with a projection lens designed to display content within a preset area. The first ranging sensor collects position data of a target object within a projection calibration frame formed by the projection lens. The processor calculates area data of an adjusted projection calibration frame based on the position data. The focal length controller adjusts the focal length of the projection lens according to the area data, allowing for changes in the area of the projection calibration frame.

Career Highlights

Wenyue Wang is currently associated with Goertek Inc., where she continues to innovate and develop advanced projection technologies. Her work has garnered attention for its practical applications and technological advancements.

Collaborations

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Conclusion

Wenyue Wang's contributions to projection technology exemplify her innovative spirit and dedication to advancing the field. Her patent reflects her expertise and commitment to creating effective solutions in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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