Beijing, China

Wenyue Li

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Beijing Zitiao Network Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenyue Li. Retrieved from https://idiyas.com/inventor/wenyue-li-xd3xvuoy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Wenyue Li - Innovator in Stylized Image Generation

Introduction

Wenyue Li is a talented inventor based in Beijing, China. She is known for her innovative work in the field of image generation technology. Although she currently holds no granted patents, her contributions to the development of stylized image generation methods are noteworthy.

Latest Patent Applications

Wenyue Li has filed several patent applications that showcase her expertise. One of her latest applications is for a "STYLIZED IMAGE GENERATION METHOD AND APPARATUS, ELECTRONIC DEVICE AND STORAGE MEDIUM." This application outlines a method that involves determining initial pairing data and training a style model to generate stylized images. Another significant application is for a "METHOD AND APPARATUS FOR GENERATING STYLIZED IMAGE, ELECTRONIC DEVICE, AND STORAGE MEDIUM." This application describes a process for constructing sample generation models to create stylized images that fuse different style types.

Conclusion

Wenyue Li's innovative approaches in stylized image generation highlight her potential as a leading inventor in this emerging field. Her latest patent applications reflect her commitment to advancing technology and creativity in image processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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