Shanghai, China

Wenyu Shang

This inventor holds 2 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignee: Polyone-Shanghai, China. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenyu Shang. Retrieved from https://idiyas.com/inventor/wenyu-shang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018

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2 patents (USPTO):Explore Patents

Title: Wenyu Shang: Innovator in Functional Additives

Introduction

Wenyu Shang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of functional additives, holding 2 patents that showcase his innovative approach to protecting sensitive materials.

Latest Patents

One of his latest patents is for a masterbatch containing a heat-sensitive functional additive. This invention protects the additive from multiple heat histories by mixing it at ambient temperature with a pre-formed masterbatch. This allows for the additive to be let down into thermoplastic resin at the time of final shaping of the plastic article. Another significant patent is for a composition designed to protect beta-carotene from visible light photo-oxidation. This composition utilizes a combination of a quinophthalone dye, a pyrazolone dye, and a methine dye to shield beta-carotene from visible light in the range of 400-500 nm.

Career Highlights

Wenyu Shang is currently employed at Polyone in Shanghai, China. His work focuses on developing innovative solutions that enhance the stability and performance of various materials.

Collaborations

He collaborates with talented coworkers, including Ling Zhu and Yong Wang, who contribute to his projects and innovations.

Conclusion

Wenyu Shang's contributions to the field of functional additives demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and a dedication to improving product performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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