Beijing, China

Wenxu Lv

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Boe Technology Group, Chengdu Boe Optoelectronics Technology Co., Ltd.. Active years: 2026.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Wenxu Lv

Introduction

Wenxu Lv is a notable inventor based in Beijing, China. He has made significant contributions to the field of mask technology, particularly in the design and manufacturing processes. His innovative approach has led to the development of a unique mask structure that enhances functionality and user experience.

Latest Patents

Wenxu Lv holds a patent for a mask, which includes a mask body featuring a plurality of grooves. These grooves are strategically distributed at intervals on the first surface of the mask body, and a hollowed-out structure is provided within each groove. Additionally, a mask strip is affixed to the mask body, with a pattern region that aligns with the orthographic projection of the groove on the first surface. This innovative design aims to improve the effectiveness and comfort of masks.

Career Highlights

Throughout his career, Wenxu Lv has worked with prominent companies in the technology sector. He has been associated with Chengdu BOE Optoelectronics Technology Co., Ltd. and BOE Technology Group. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge projects in the field of optoelectronics.

Collaborations

Wenxu Lv has collaborated with esteemed colleagues, including Dengjun Guo and Junji Zhou. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Wenxu Lv's contributions to mask technology and his collaborations with leading companies and professionals highlight his role as an influential inventor. His innovative designs continue to impact the industry positively.

Profile summary based on public USPTO records.
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